Inorganic polymer photoresist for direct ceramic patterning by photolithography.

نویسندگان

  • Tuan Anh Pham
  • Pilnam Kim
  • Moonkyoo Kwak
  • Kahp Y Suh
  • Dong-Pyo Kim
چکیده

A novel negative, inorganic polymer photoresist was demonstrated to be suitable for simple and direct fabrication of tribological SiCN-based ceramic microstructures via UV photolithography and subsequent pyrolysis at 800 degrees C.

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عنوان ژورنال:
  • Chemical communications

دوره 39  شماره 

صفحات  -

تاریخ انتشار 2007